Application of Tricine |CAS:5704-04-1|in the Field of Semiconductor Wafers
Tricine(CAS:5704-04-1) is an excellent amphoteric good's buffer. CN106085245B patent introduces a chemical mechanical polishing (CMP) preparation of copper, and its main components are as follows: 1. Particulate material(0.001-0..25%): particulate material selected from fumed silica, colloidal silica, fumed alumina, colloidal alumina, ceria, titania, zirconia, polystyrene, polymethylmethacrylate E...